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Changes in the electrical resistance of oriented graphitic carbon films induced by atomic hydrogen

✍ Scribed by Moafi, Ali ;Partridge, James G. ;Sadek, Abu Z. ;McCulloch, Dougal G.

Book ID
118028080
Publisher
The Royal Society of Chemistry
Year
2013
Tongue
English
Weight
398 KB
Volume
1
Category
Article
ISSN
2050-7488

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A number of alkylsilanes and alkylcarbosilanes of widely different molecular structure are characterized in terms of their ability to form amorphous hydrogenated silicon-carbon (a-Si:C:H) films in atomic hydrogen-induced chemical vapor deposition (AHCVD). The compounds containing only Si-C and C-H b