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Challenges in the implementation of low-k dielectrics in the back-end of line

✍ Scribed by R.J.O.M. Hoofman; G.J.A.M. Verheijden; J. Michelon; F. Iacopi; Y. Travaly; M.R. Baklanov; Zs. Tökei; G.P. Beyer

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