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CF4 decomposition of flue gas from semiconductor process using inductively coupled plasma

✍ Scribed by Kuroki, T.; Mine, J.; Odahara, S.; Okubo, M.; Yamamoto, T.; Saeki, N.

Book ID: 117917104
Publisher: IEEE
Year: 2005
Tongue: English
Weight: 627 KB
Volume: 41
Category: Article
ISSN: 0093-9994
DOI: 10.1109/tia.2004.840954

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