๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Calorimetric characterization of photosensitive materials

โœ Scribed by B. K. Appelt; M. J. M. Abadie


Book ID
104522222
Publisher
Society for Plastic Engineers
Year
1988
Tongue
English
Weight
475 KB
Volume
28
Category
Article
ISSN
0032-3888

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Synthesis and characterization of photos
โœ Pukun Zhu; Zuobang Li; Qiang Wang; Wei Feng; Lixin Wang ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 164 KB ๐Ÿ‘ 2 views

Photosensitive copolysiloxaneimides were prepared by adding a photosensitive monomer such as hydroxyethylacrylate (HEA) to copolyisoimides, which were synthesized by the copolycondensation of pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride with oxydianiline, and bis(p-aminophenoxy

Synthesis and characterization of photos
โœ F. Sun; S.L. Jiang ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 440 KB

UV-curable polydimethylsiloxane epoxy acrylate (PESA) was synthesized by reacting epoxy polydimethylsiloxane with acrylic acid (AA). It is shown that the optimum synthesis temperature for PESA is 100-110 ยฐC and triethylamine is best one among those catalysts tested. The structure of the oligomer was