Building bulk-resist model for image formation in chemically amplified resists at EUV

✍ Scribed by Piyush Pathak; Qiliang Yan; Thomas Schmoeller; Ebo Croffie; Lawrence S. Melvin III

• Publisher: Elsevier Science
• Year: 2009
• Tongue: English
• Weight: 754 KB
• Volume: 86
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.12.020