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Bremsstrahlung by neutral atomic nitrogen

โœ Scribed by T.L. John; R.J. Williams


Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
194 KB
Volume
19
Category
Article
ISSN
0022-4073

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โœ Th. Schulze; B. Brezger; P.O. Schmidt; R. Mertens; A.S. Bell; T. Pfau; J. Mlynek ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 1019 KB

Instead of using a solid mask to pattern a light beam (optical lithography) we used a mask made of light to pattern a beam of neutral atoms (atom lithography). By making use of two special features of the atom-light interaction we wrote structures with periods below A/2. In the first approach we inv