Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions

✍ Scribed by A. Schiltz; J-F. Terpan; G. Amblard; P.J. Paniez

• Book ID: 104306248
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 299 KB
• Volume: 35
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(96)00087-1

✦ Synopsis

This paper investigates the thermal process conditions of the CD11 Bottom Anti-Reflective Coating for DUV lithography using various characterization techniques such as TGA and DSC. The thermal modifications of the material are related to the variations in its functional properties, namely degree of solubility, absorption, thickness and reflectivity. A thermal process window is defined to obtain maximum improvement from this technology. The CD11 BARC exhibits stable functional properties over the process window. This work has been carried out within the GRESSI Consortium between CEA-LETI and France Telecom-CNET