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Boron interaction with extended defects induced by He–H co-implantation in Si

✍ Scribed by G. Gaudin; F. Cayrel; C. Bongiorno; R. Jérisian; C. Dubois; V. Raineri; D. Alquier


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
174 KB
Volume
124-125
Category
Article
ISSN
0921-5107

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