Boron distribution in silicon after excimer laser annealing with multiple pulses

✍ Scribed by E.V. Monakhov; B.G. Svensson; M.K. Linnarsson; A. La Magna; M. Italia; V. Privitera; G. Fortunato; M. Cuscunà; L. Mariucci

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 201 KB
• Volume: 124-125
• Category: Article
• ISSN: 0921-5107
• DOI: 10.1016/j.mseb.2005.08.058