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Comparative characterization of boron-implanted silicon after pulse laser annealing along single traces by SEM (SE, EBIC) and TEM studies

✍ Scribed by H. Johansen; Dr. H. Bartsch; Prof. Dr. J. Heydenreich; Dr. B. Lämmel


Publisher
John Wiley and Sons
Year
1985
Tongue
English
Weight
777 KB
Volume
20
Category
Article
ISSN
0232-1300

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