๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Boron diffusion in silicon

โœ Scribed by Marchiando, J.F.; Roitman, P.; Albers, J.


Book ID
114595330
Publisher
IEEE
Year
1985
Tongue
English
Weight
1000 KB
Volume
32
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Boron diffusion in amorphous silicon
โœ V.C. Venezia; R. Duffy; L. Pelaz; M.J.P. Hopstaken; G.C.J. Maas; T. Dao; Y. Tamm ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 125 KB
Boron diffusion in silicon at high conce
โœ Orr Arienzo, W. A.; Glang, R.; Lever, R. F.; Lewis, R. K.; Morehead, F. F ๐Ÿ“‚ Article ๐Ÿ“… 1988 ๐Ÿ› American Institute of Physics ๐ŸŒ English โš– 908 KB
Diffusion of Boron Implanted into Silico
โœ Stelmakh, V. F. ;Suprun-Belevich, Yu. R. ;Tkachev, V. D. ;Chelyadinskii, A. R. ๐Ÿ“‚ Article ๐Ÿ“… 1985 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 240 KB