Boron and phosphorus diffusion through an SiO2 layer from a doped polycrystalline Si source under various drive-in ambients

✍ Scribed by K. Shimakura; T. Suzuki; Y. Yadoiwa

• Publisher: Elsevier Science
• Year: 1975
• Tongue: English
• Weight: 644 KB
• Volume: 18
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(75)90117-3