Treatment of nanocrystalline diamond fil
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C.R.B. Miranda; M. Ueda; M.R. Baldan; A.F. Beloto; N.G. Ferreira
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Article
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2010
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Elsevier Science
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English
โ 778 KB
The influence of N 2 Plasma Immersion Ion Implantation (PIII) on undoped nanocrystalline diamond (NCD) films grown on silicon substrate by CVD process using a hot filament reactor was systematically studied. Before and after the implantation, NCD films were investigated using scanning electron micro