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Block Copolymers as a Tool for Nanomaterial Fabrication

✍ Scribed by M. Lazzari; M.A. López-Quintela

Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
533 KB
Volume
15
Category
Article
ISSN
0935-9648

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✦ Synopsis

Abstract

In this review the latest developments regarding the use of self‐assembled copolymers for the fabrication of nanomaterials will be presented and their real potential evaluated. Most of the strategies reported so far are herewith classified under two main approaches: a) use of block copolymers as nanostructured materials, either “as they are” or through a selective isolation of one or more component blocks, and b) as templates for the synthesis of metallic or semiconducting nanomaterials. The problems of the orientation and large‐scale order of self‐organizing block copolymer mesophases will be also introduced, due to their importance as a route towards further improvements of the nanofabrication means.

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A technique to fabricate porous carbon micropillars using a block copolymer, F127, as porogen is described. In this process, negative tone photoresist (i.e. SU-8) mixed with F127 was photopatterned and carbonized under inert atmosphere. The thermal behavior of the photoresist precursor (F127 + SU-8)