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Bistable growth in laser chemical vapor deposition

✍ Scribed by P. B. Kargl; R. Kullmer; D. Bäuerle


Book ID
104725923
Publisher
Springer
Year
1993
Tongue
English
Weight
258 KB
Volume
57
Category
Article
ISSN
1432-0630

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Growth kinetics of laser chemical vapor
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The analysis of the time evolution of W spots deposited from WF6+H2 mixtures by an Ar+ laser reveals that at different partial pressure ratios different chemical pathways are preferred. For high p(H2)/p(WF6) ratios the rate limiting step is hydrogen desorption from the tungsten surface with an activ