The present position and future status o
โ
T. Matsuzaka
๐
Article
๐
1997
๐
Elsevier Science
๐
English
โ 386 KB
Electron beam lithography is available in fabrication for ASIC-LSIs in order to contribute QTAT process and cost saving for optical reticle making. On the other hand, the optical lithography is facing difficulty in the resolution for isolated pattern arrangement under quarter micron region even if K