Basic properties of metal/insulator/semiconductor structures containing borazone and diamond layers produced by the reactive pulse plasma method

✍ Scribed by J. Szmidt; A. Jakubowski; A. Michalski; A. Rusek

• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 914 KB
• Volume: 110
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(83)90169-4