𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Basic characteristics of the a-SiOC∶H thin films prepared by PE CVD

✍ Scribed by J. Vanek; V. Cech; R. Prikryl; J. Zemek; V. Perina

Book ID
105721231
Publisher
Springer
Year
2004
Tongue
English
Weight
295 KB
Volume
54
Category
Article
ISSN
0011-4626

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Plasma characteristics of low-k SiOC(–H)
Plasma characteristics of low-k SiOC(–H) films prepared by using plasma enhanced chemical vapor deposition from DMDMS/O2 precursors
✍ An Soo Jung; R. Navamathavan; Kwang Man Lee; Chi Kyu Choi 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 680 KB

We report in-situ plasma diagnostics during the deposition of low dielectric constant SiOC(-H) thin films on p-Si(100) substrates by using plasma enhanced chemical vapor deposition with dimethyldimethoxysilane (DMDMS, C 4 H 12 O 2 Si) and oxygen gas as precursors. The bulk plasma was characterized b