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Band discontinuity in GaAs/AlAs superlattices with InAs strained insertion-layers

โœ Scribed by T. Saito; Y. Hashimoto; T. Ikoma


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
128 KB
Volume
15
Category
Article
ISSN
0749-6036

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โœฆ Synopsis


We have theoretically investigated the valence-band discontinuity (\left(\Delta E_{v}\right)) at the (100) GaAs/AlAs interface with the InAs strained insertion-layer. The theoretical calculation is carried out by the self-consistent tight-binding method with the (s p^{3} s^{*}) basis in the ((\mathrm{GaAs}){5} /(\mathrm{InAs}){1} /(\mathrm{AlAs}){5} /(\mathrm{InAs}){1}[100]) superlattice. (\Delta E_{\mathrm{v}}) at the (\mathrm{GaAs} / \mathrm{InAs}(1 \mathrm{ML}) / \mathrm{AlAs}) interface is calculated to be (0.50 \mathrm{eV}), which is practically equal to (\Delta E_{v}=0.51 \mathrm{eV}) at the GaAs/AlAs interface with no InAs layers. The insertion of the InAs monolayer changes the detail of valence charge density at the GaAs/AlAs interface but does not change (\Delta E_{v}). The result of calculation is in consistent with our experimental measurement by using the (\mathrm{x})-ray photoelectron spectroscopy.


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