AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing

✍ Scribed by M. Schumacher; P. K. Baumann; T. Seidel

• Book ID: 102815484
• Publisher: John Wiley and Sons
• Year: 2006
• Tongue: English
• Weight: 821 KB
• Volume: 12
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/cvde.200500027