AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing

✍ Scribed by Marcus Schumacher; Peter K. Baumann; Tom Seidel

• Book ID: 101984864
• Publisher: John Wiley and Sons
• Year: 2006
• Weight: 8 KB
• Volume: 37
• Category: Article
• ISSN: 0931-7597
• DOI: 10.1002/chin.200621221