๐”– Bobbio Scriptorium
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Atomic-layer titration of surface reactions

โœ Scribed by Tromp, R. M.; Michely, T.


Book ID
109791109
Publisher
Nature Publishing Group
Year
1995
Tongue
English
Weight
494 KB
Volume
373
Category
Article
ISSN
0028-0836

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Atomic layer deposition of Al2O3 and SiO
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Al O and SiO were deposited on BN particles with atomic layer control using alternating exposures of Al CH rH O 2 3 2 3 3 2 and SiCl rH O, respectively. The sequential surface chemistry was monitored in vacuum using transmission Fourier 4 2 ลฝ . transform infrared FTIR spectroscopy studies on high su