Atomic-layer epitaxy control of Ge and Si in flash-heating CVD using GeH4 and SiH4 gases

✍ Scribed by Masao Sakuraba; Junichi Murota; Takeshi Watanabe; Yasuji Sawada; Shoichi Ono

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 377 KB
• Volume: 82-83
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(94)90241-0