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Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles

✍ Scribed by Aile Tamm; Mukesh C. Dimri; Jekaterina Kozlova; Aleks Aidla; Tanel Tätte; Tõnis Arroval; Uno Mäeorg; Hugo Mändar; Raivo Stern; Kaupo Kukli


Book ID
116630053
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
673 KB
Volume
343
Category
Article
ISSN
0022-0248

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Aluminum oxide (Al 2 O 3 ) films were produced on n-type (001) Si, SiO 2 and polyimide (PI) substrates by atomic layer deposition method (ALD). The surface morphologies of the coatings were characterized by XRD and AFM, respectively. The adhesive properties of the deposits were investigated as a fun