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Atomic layer deposition of Al_2O_3 and TiO_2 multilayers for applications as bandpass filters and antireflection coatings

✍ Scribed by Szeghalmi, Adriana ;Helgert, Michael ;Brunner, Robert ;Heyroth, Frank ;Gösele, Ulrich ;Knez, Mato

No coin nor oath required. For personal study only.

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