Atomic layer controlled deposition of silicon nitride and in situ growth observation by infrared reflection absorption spectroscopy

✍ Scribed by Shin Yokoyama; Hiroshi Goto; Takahiro Miyamoto; Norihiko Ikeda; Kentaro Shibahara

• Book ID: 108418457
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 434 KB
• Volume: 112
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/s0169-4332(96)01020-3