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Atomic Force Microscopy study of hexagonal boron nitride film growth on 6H-SiC (0001)

✍ Scribed by Chen, Wei ;Ping Loh, Kian ;Lin, Ming ;Liu, Rong ;Wee, Andrew T. S.


Book ID
105363764
Publisher
John Wiley and Sons
Year
2005
Tongue
English
Weight
185 KB
Volume
202
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

Boron nitride thin films with their unique mechanical and electrical properties are of interest for various applications and have been grown on a number of different substrates. The cover picture from this issue's Editor's Choice [1] shows an Atomic Force Microscopy topography of a hexagonal BN film grown on 6H‐SiC substrate by Plasma Enhanced Chemical Vapor Deposition at 600 °C. Interesting stress‐relief features developed on the non‐reactive substrate. The corresponding author Kian Ping Loh is Assistant Professor at the National University of Singapore. His research is devoted to the growth of diamond and boron nitride thin films and the fabrication of nanocrystalline diamond and boron nitride nanotubes.

As a follow‐up to the recent special issue on ‘Physics of Organic Semiconductors’ [2], Detlef Berner gives insights into organic light emitting diode functioning by coordinated experiment and simulation in his Review Article [3].

The present issue also sees the start of our rapid research letters, the fastest peer‐reviewed publication medium in solid state physics. For more information see www.pss‐rapid.com and the Editorial by the Editor‐in‐Chief Martin Stutzmann on page 7 [4].


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Atomic force microscopy study of hexagon
✍ Chen, Wei ;Loh, Kian Ping ;Lin, Ming ;Liu, Rong ;Wee, Andrew T. S. 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 709 KB

## Abstract The growth of hexagonal Boron Nitride films (__h__‐BN) on 6H‐SiC (0001) using plasma‐excited borazine has been studied. On 6H‐SiC (0001), the growth of pin‐hole free, compact __h__‐BN film is difficult due to poor wetting properties between __h__‐BN and 6H‐SiC. The strained BN layer rel