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Atomic force microscopic study of structures of cleaved surfaces of CaSO4 after wet chemical etching

โœ Scribed by Hitoshi Shindo; Hisakazu Nozoye


Publisher
Elsevier Science
Year
1993
Weight
68 KB
Volume
287-288
Category
Article
ISSN
0167-2584

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Wet-chemical nanoscale patterning of GaA
โœ B. Klehn; S. Skaberna; U. Kunze ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 461 KB

Sub-100 nm V-grooves in GaAs(001) surfaces have been fabricated by patterning a thin photoresist layer with an atomic force microscope (AFM) and subsequent wet-chemical etching. The nanolithography is based on the dynamic ploughing technique. Anisotropic etchants under investigation are bromine-meth