Wet-chemical nanoscale patterning of GaA
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B. Klehn; S. Skaberna; U. Kunze
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Article
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1999
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Elsevier Science
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English
โ 461 KB
Sub-100 nm V-grooves in GaAs(001) surfaces have been fabricated by patterning a thin photoresist layer with an atomic force microscope (AFM) and subsequent wet-chemical etching. The nanolithography is based on the dynamic ploughing technique. Anisotropic etchants under investigation are bromine-meth