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Atmospheric rf plasma deposition of superhydrophobic coatings using tetramethylsilane precursor

✍ Scribed by Marchand, David J.; Dilworth, Zachary R.; Stauffer, Robert J.; Hsiao, Erik; Kim, Jeong-Hoon; Kang, Jung-Gu; Kim, Seong H.

Book ID
121363761
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
977 KB
Volume
234
Category
Article
ISSN
0257-8972

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## Abstract Hybrid organic‐inorganic precursors and sol–gel systems thereof, obtained via wet‐chemical hydrolysis, were atomized and introduced into an atmospheric pressure dielectric barrier discharge (DBD) in nitrogen. The precursors used are tetraethoxysilane (TEOS), glycidoxypropyltrimethoxysil