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Atmospheric pressure chemical vapour deposition of polycarbosilane films via UV laser-induced polymerization of ethynyltrimethylsilane

✍ Scribed by J. Pola; Z. Bastl; A. Ouchi; J. Šubrt; H. Morita

Book ID
108422973
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
549 KB
Volume
149
Category
Article
ISSN
0257-8972

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The UV-induced photolysis of trimethyl(vinyloxy)silane (TMVSi) induced by ArF laser, affording a multitude of unsaturated hydrocarbons and a solid polydimethylsiloxane, represents a convenient process of chemical vapour deposition in which the silicon of the parent is almost completely utilized for