Atmospheric pressure chemical vapor deposition of transparent conducting films of fluorine doped zinc oxide and their application to amorphous silicon solar cells

Textured fluorine-doped ZnO films by atm

Textured fluorine-doped ZnO films by atmospheric pressure chemical vapor deposition and their use in amorphous silicon solar cells

✍ Jianhua Hu; Roy G. Gordon 📂 Article 📅 1991 🏛 Elsevier Science ⚖ 854 KB

Fluorine-doped ZnO films were deposited on soda lime glass by atmospheric pressure chemical vapor deposition at temperatures from 350 to 470 °C by using diethyl zinc, ethanol and hexafiuoropropene as precursors. The deposited films typically contained about 0.1 to about 1.0 at.% fluorine with conduc