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Atmospheric pressure chemical vapor deposition of titanium dioxide films from TiCl4

✍ Scribed by B. Arvan; A. Khakifirooz; R. Tarighat; S. Mohajerzadeh; A. Goodarzi; E.Asl. Soleimani; E. Arzi

No coin nor oath required. For personal study only.

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## Abstract For Abstract see ChemInform Abstract in Full Text.

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