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Aspects of the selective deposition of TiSi2 by LRP-CVD for use in ULSI submicron technology

✍ Scribed by J.L. Regolini; E. Mastromatteo; M. Gauneau; J. Mercier; D. Dutartre; G. Bomchil; C. Bernard; R. Madar; D. Bensahel

Book ID: 103615808
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 464 KB
Volume: 53
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(91)90236-d

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