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As redistribution during Ti silicide formation

✍ Scribed by Ning Yu; Zuyao Zhou; Wei Zhou; Shichang Tsou; Dezhang Zhu


Book ID
114168101
Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
257 KB
Volume
19-20
Category
Article
ISSN
0168-583X

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πŸ“œ SIMILAR VOLUMES


Ti Silicide formation using as ion beam
✍ Ning Yu; Zuyao Zhou; Wei Zhou; Shichang Tsou; Dezhang Zhu πŸ“‚ Article πŸ“… 1987 πŸ› Elsevier Science 🌐 English βš– 246 KB
Ti-silicide formation during isochronal
✍ T. Stark; L. Gutowski; M. Herden; H. GrΓΌnleitner; S. KΓΆhler; M. Hundhausen; L. L πŸ“‚ Article πŸ“… 2001 πŸ› Elsevier Science 🌐 English βš– 814 KB

Single-wavelength ellipsometry is employed to monitor in situ the reaction of titanium layers of different thickness (10-80 nm) with Si(100) to form titanium silicides during heating at constant rates up to 100 K / min. Previous studies performed on the platinum / silicon system showed that by the u