Arsenic-induced etched nanovoids on GaSb (100)

AFM tip induced selective electrochemica

AFM tip induced selective electrochemical etching of and metal deposition on p-GaAs(100) surface

✍ Michio Koinuma; Kohei Uosaki 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 678 KB

An angle-resolved TOF study on the UV la

An angle-resolved TOF study on the UV laser-induced etching of InP(100) surface with chlorine

✍ Q.Z. Qin; P.H. Lu; Z.J. Zhuang; Q.K. Zheng 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 448 KB

Angular and velocity distributions of desorbing products from UV laser-induced etching of InP( 100) surface with a supersonic chlorine molecular beam have been measured with a rotatable quadrupole mass spectrometer. Pulsed laser irradiation at 355 nm produced InCl angular distributions can be fit by

[American Vacuum Soc 1998 3rd Internatio

[American Vacuum Soc 1998 3rd International Symposium on Plasma Process-Induced Damage - Honolulu, HI, USA (4-5 June 1998)] 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) - Surface damage in III-V devices by dry etching

✍ Pang, S.W. 📂 Article 📅 1998 🏛 American Vacuum Soc ⚖ 530 KB

[American Vacuum Soc 1998 3rd Internatio

[American Vacuum Soc 1998 3rd International Symposium on Plasma Process-Induced Damage - Honolulu, HI, USA (4-5 June 1998)] 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) - Backside films and charging during via etch in LOCOS and STI technologies

✍ Hook, T.B. 📂 Article 📅 1998 🏛 American Vacuum Soc ⚖ 394 KB

[American Vacuum Soc 1998 3rd Internatio

[American Vacuum Soc 1998 3rd International Symposium on Plasma Process-Induced Damage - Honolulu, HI, USA (4-5 June 1998)] 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100) - Effects of low energy light ions on notching and charging in high-density plasma [etching]

✍ Tabara, S. 📂 Article 📅 1998 🏛 American Vacuum Soc ⚖ 447 KB