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Ar+ion beam induced silicide formation mechanism at the Pd-Si interface

✍ Scribed by C. N. Whang; H. K. Kim; R. Y. Lee; R. J. Smith


Book ID
104870602
Publisher
Springer
Year
1989
Tongue
English
Weight
577 KB
Volume
24
Category
Article
ISSN
0022-2461

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