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Applications of ion implantation in III–V device technology

✍ Scribed by S.J. Pearton; F. Ren; S.N.G. Chu; W.S. Hobson; C.R. Abernathy; T.R. Fullowan; J.R. Lothian; R.G. Elliman; D.C. Jacobson; J.M. Poate

No coin nor oath required. For personal study only.

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