Application of vapor phase decomposition techniques (VPD/AAS and ICP-MS) for trace element analysis in oxide coatings on silicon

Characterization and Application of the

Characterization and Application of the Vapor Phase Decomposition Technique for Trace Metal Analysis on Silicon Oxide Surfaces

✍ Hall, L. H.; Sees, J. A.; Schmidt, B. L. 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 606 KB

Vapor phase decomposition-droplet surface etching-graphite furnace atomic absorption spectroscopy (VPD-DSE-GFAAS) is discussed as a technique for the determination of low levels of metals in chemical oxides on silicon surfaces. The VPD-DSGGFAAS technique was found to be statistically equivalent to r