Application of TOF-SIMS for high precision ion implant dosimetry: Possibilities and limitations

✍ Scribed by Thomas Grehl; Rudolf Möllers; Ewald Niehuis; Derk Rading

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 879 KB
• Volume: 255
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/j.apsusc.2008.06.044