Application of dynamic in-situ ellipsometry and quadrupole mass spectrometry to plasma-assisted etching: Polymer formation and removal

✍ Scribed by MC Flowers; R Greef; CMK Starbuck; P Southworth; DJ Thomas

• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 839 KB
• Volume: 40
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(90)90001-f