Quantitative AES analysis and preferenti
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Palacio, C.
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Article
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1999
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John Wiley and Sons
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English
โ 98 KB
๐ 2 views
Quantitative AES analysis of TiSi x (1.3 โค x โค 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de