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Antireflective properties of AZO subwavelength gratings patterned by holographic lithography

✍ Scribed by J. W. Leem; Y. M. Song; Y. T. Lee; J. S. Yu

Book ID: 106029774
Publisher: Springer
Year: 2010
Tongue: English
Weight: 1002 KB
Volume: 99
Category: Article
ISSN: 0721-7269
DOI: 10.1007/s00340-010-4030-x

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Sub-quarter-micron grating patterns with period as fine as 0.22 p.m have been obtained by combining DUV holographic lithography and silylation technique for the first time. A traditional chemical amplified resist (JSR KRF/K2G) originally working for single layer process at 248 nm wavelength was used