A lower limit to t?re OH(X a 11) vibrational escitation produced by the reaction O(r D) + Ha has been obsewed using a low-pressure infrared chemilumiuescence anoaratus. The O(' D) was generated by laser photolysis of OS\_ The measured \_\* OH(v') vibrational distribution is inverted; it peaks at U'
Anomalously high vibrational excitation in the product OH from the reaction of O(1D) with tetramethylsilane
โ Scribed by Seiichiro Koda; Shinsuke Suga; Congxiang Chen
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 448 KB
- Volume
- 173
- Category
- Article
- ISSN
- 0009-2614
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โฆ Synopsis
The vibrational excitation of the product OH from the reaction of 0( 'D) with tetramethylsilane has been found to be anomalously high compared to that from the reaction with neopentane, which suggests that the energy migration mechanism in the intermediate of the above reactions is considerably dependent on the nature of the central atom. whether it is silicon or carbon.
๐ SIMILAR VOLUMES
Rotational and vibrational state distributions of the OH radicals produced in the reaction 160( I D) "at" H21So ~ x6OH + IsOH have been determined using a laser-induced fluorescence technique. 160(ID) was prepared by the 193 nm photodissociation of N20. The rotational distributions for 16OH and 1sOH
Measurements of the enhancement of CbrationalIyexcited 02('Zi) formation by added 02 in the UV flashphotolysis of 03'indicate that 02(3Z$v\*r,~ is formed in the deactitition cf O('D) by 02 with an efficiency of 5 0.3. These measurements are also consistent with the formation of 02(3~-) g y",,-, in t
The populations of the nascent CO formed in the reactions oi COS with 0(3P~) and O(" Dz) atoms: O? P) + cos s co? + so, O(' D) c COS 4 COi + SO have been determined by a CO laser resonant absorption method. The fraction of the total available energy channelled into CO as vibration ~1s calculated to