Annealing in water vapor as a new method for improvement of silicon thin film properties

✍ Scribed by S. Honda; A. Fejfar; J. Kočka; T. Yamazaki; A. Ogane; Y. Uraoka; T. Fuyuki

• Book ID: 116669217
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 209 KB
• Volume: 352
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/j.jnoncrysol.2006.01.061