✦ LIBER ✦
Specific features of silicon surface region fluorination by RIE in r.f. CF4 plasma – A novel method for improving the electrical properties of thin PECVD silicon oxide films
✍ Scribed by Małgorzata Kalisz; Robert Mroczyński
- Book ID
- 113797947
- Publisher
- Elsevier Science
- Year
- 2012
- Tongue
- English
- Weight
- 754 KB
- Volume
- 94
- Category
- Article
- ISSN
- 0167-9317
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