The formation mechanism of a high density of nanovoids by annealing amorphous Al 2 O 3 thin films prepared by an electron beam deposition method was investigated. Transmission electron microscopy observations revealed that nanovoids $1-2 nm in size were formed by annealing amorphous Al 2 O 3 thin fi
β¦ LIBER β¦
Annealing effects on structure in amorphous Al2O3 models
β Scribed by Vo Van Hoang; Suhk Kun Oh
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 405 KB
- Volume
- 364
- Category
- Article
- ISSN
- 0921-4526
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