๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Angle-resolved and depth profiling XPS investigation of a monolayer niobium oxide catalyst

โœ Scribed by F. Verpoort; G. De Doncker; A.R. Bossuyt; L. Fiermans; L. Verdonck


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
584 KB
Volume
73
Category
Article
ISSN
0368-2048

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Parallel angle resolved XPS investigatio
โœ B. Pelissier; A. Beaurain; J.P. Barnes; R. Gassilloud; F. Martin; O. Joubert ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 420 KB

Parallel angle resolved X-ray photoelectron spectroscopy (ARXPS) was used to study the oxidation of W and WSi x thin films CVD-deposited on 12 in. silicon wafers. The thin films were exposed to air during defined periods of time. Immediately after layer deposition, the wafers were rapidly loaded in