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Analytical model of the “Shot Noise” effect in photoresist

✍ Scribed by Gregg M. Gallatin; J. Alexander Liddle


Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
435 KB
Volume
46
Category
Article
ISSN
0167-9317

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✦ Synopsis


Decreasing feature size implies increased sensitivity to statistical fluctuations in various process parameters such as dose and the number of relevant bonds broken during post exposure bake. Here we develop a generic analytical model which accounts for essentially all these effects. The lowest order contribution to surface roughness from the bond statistics alone are shown to be very similar to recent experimental data. The lowest order contribution to a scaling law for predicting edge roughness is also derived.


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