The use of high-order orthogonal collocation methods leads to accurate prediction of the critical Lewis number characterizing the transient instability of the steady states of a catalyst particle with arbitrary external resistance. When combined with a suitable algorithm for the determination of the
β¦ LIBER β¦
Analysis of wiped film reactors using the orthogonal collocation technique
β Scribed by Santosh K. Gupta; Anup K. Ghosh; Sushil K. Gupta; Anil Kumar
- Publisher
- John Wiley and Sons
- Year
- 1984
- Tongue
- English
- Weight
- 553 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0021-8995
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