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Use of orthogonal collocation methods for the modeling of catalyst particles—II analysis of stability

✍ Scribed by B. Van den Bosch; L. Padmanabhan


Publisher
Elsevier Science
Year
1974
Tongue
English
Weight
504 KB
Volume
29
Category
Article
ISSN
0009-2509

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✦ Synopsis


The use of high-order orthogonal collocation methods leads to accurate prediction of the critical Lewis number characterizing the transient instability of the steady states of a catalyst particle with arbitrary external resistance. When combined with a suitable algorithm for the determination of the characteristic polynomial of a matrix, the method becomes quite efficient. First-order approximations such as lumoine, collocation or a combination of both, as well as the Paterson-Cresswell tech-

. I nique are not satisfactory for stability analysis.


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Use of orthogonal collocation methods fo
✍ B. Van Den Bosch; L. Padmanabhan 📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 704 KB

Different collocation methods are compared in their ability to predict the effectiveness factor for the general case of a catalyst particle with both internal and external resistance to mass and heat transfer. The accuracy of the methods in determining the bifurcation points which separate regions o

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Obviously this is a rough approximation, Etiicularly since the time intervals are rather large for purposes of timeaveraging and the reaction rate itself changes rapidly with time. However, in view of the difficulties in the experimental procedure and limitations of accuracy attainable in it, a more